Computational Lithography

Auteur: Ma, Xu
Editeur: John Wiley & Sons Inc
This is the first book to address the optimization of resolution enhancement techniques in optical lithography. It provides an in-depth discussion of RET tools that use model-based mathematical optimization approaches.
Sur commande
This is the first book to address the optimization of resolution enhancement techniques in optical lithography. It provides an in-depth discussion of RET tools that use model-based mathematical optimization approaches.
ISBN / EAN 9780470596975
Auteur Ma, Xu
Editeur John Wiley & Sons Inc